- multilayer resist
- багатошаровий резист
English-Ukrainian dictionary of microelectronics. 2013.
multilayer resist
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Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Business and Industry Review — ▪ 1999 Introduction Overview Annual Average Rates of Growth of Manufacturing Output, 1980 97, Table Pattern of Output, 1994 97, Table Index Numbers of Production, Employment, and Productivity in Manufacturing Industries, Table (For Annual… … Universalium
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EUV-Lithografie — (auch kurz EUVL) ist ein Fotolithografie Verfahren, das elektromagnetische Strahlung mit einer Wellenlänge von 13,5 nm (91,82 eV) nutzt, sogenannte extrem ultraviolette Strahlung (englisch extreme ultra violet, EUV). Dies soll es… … Deutsch Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Nerve guidance conduit — A nerve guidance conduit (also referred to as an artificial nerve conduit or artificial nerve graft, as opposed to an autograft) is an artificial means of guiding axonal regrowth to facilitate nerve regeneration and is one of several clinical… … Wikipedia
Superlens — A superlens, super lens or perfect lens is a lens which uses metamaterials to go beyond the diffraction limit. The diffraction limit is an inherent limitation in conventional optical devices or lenses.[1] In 2000, a type of lens was proposed,… … Wikipedia
computer — computerlike, adj. /keuhm pyooh teuhr/, n. 1. Also called processor. an electronic device designed to accept data, perform prescribed mathematical and logical operations at high speed, and display the results of these operations. Cf. analog… … Universalium
Strengthening mechanisms of materials — Methods have been devised to modify the yield strength, ductility, and toughness of both crystalline and amorphous materials. These strengthening mechanisms give engineers the ability to tailor the mechanical properties of materials to suit a… … Wikipedia
EUV-Lithographie — EUV Lithografie (auch kurz EUVL, Abkürzung für engl.: Extreme Ultra Violet) ist ein Fotolithografie Verfahren, das Strahlung mit einer Wellenlänge von 13,5 Nanometer (91,82 eV) nutzt (vgl. Ultraviolettstrahlung). Dies soll es ermöglichen, auch… … Deutsch Wikipedia
EUVL — EUV Lithografie (auch kurz EUVL, Abkürzung für engl.: Extreme Ultra Violet) ist ein Fotolithografie Verfahren, das Strahlung mit einer Wellenlänge von 13,5 Nanometer (91,82 eV) nutzt (vgl. Ultraviolettstrahlung). Dies soll es ermöglichen, auch… … Deutsch Wikipedia
